Другие журналы
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Tihomirov
77-48211/368736 Research of double exposure mask technology’s critical parameters
Engineering Bulletin # 05, May 2012 Algorithms of topology transformation of submicron VLSIC, oriented to application for several classes of complex function blocks, designed for further manufacturing according to the technology of double exposure mask and met the demand for reproduction of given topology according to the technology of double exposure mask.
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